Plasmatherm Dual Chamber 790 PECVD & RIE
- Plasmatherm Dual Chamber 790 PECVD & RIE system
- Manual load, Non-Loadlock system
- RFPP – RF5S RF power supply with AM5 matching network & PS2 Tuner
- Leybold NT150/360 turbo controller with Leybold 361 turbo pump
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Description
- Plasmatherm Dual Chamber 790 PECVD & RIE system
- Manual load, Non-Loadlock system
- RFPP – RF5S RF power supply with AM5 matching network & PS2 Tuner
- Leybold NT150/360 turbo controller with Leybold 361 turbo pump
- Ion Gauge with MKS 919 Ion Gauge Controller
- Watlow heaters and controler for PECVD chamber
- (6) gas lines with MFCs for each process chamber
- ond RF 350W power supply
- Plasmatherm Windows based operating system
- 208V, 60 Hz, 3 phase
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