Matrix 105 Etcher
- Plasmatherm Versaline (VLN) ICP (Ion Coupled Plasma)Etcher
- Manual Load Lock for Single or Mulitple Wafers
- Single ICP Chamber
- ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner
- ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner
- VAT PM5 Pressure Controller with Leybold Turbo pump
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Description
- Plasmatherm Versaline (VLN) ICP (Ion Coupled Plasma)Etcher
- Manual Load Lock for Single or Mulitple Wafers
- Single ICP Chamber
- ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner
- ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner
- VAT PM5 Pressure Controller with Leybold Turbo pump
- Seiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller
- VAT Gate Valve and controller
- (5) MFCs-gas with Isolation, Process and By-pass valves
- He Backside Cooling
- Watlow chamber heater and controller
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