Plasmatherm Dual Chamber 790 PECVD & RIE system

• Manual load, Non-Loadlock system up to 8″ diameter wafer
• RIE Chamber – 11″ showerhead – 10″ electrode
• PECVD Chabmer – 13″ platten – 13″ showerhead with Watlow chamber heaters and controller
• RFPP – RF5S RF power supply with matching network & PS2 Tuner
• Ebara ET300 Turbo pump with Ebara turbo controller
• Ion Gauge
• Plasmatherm Windows based operating system
• Gas distribution panel consisting of 4 MFCs per process side
• 208V, 60 Hz, 3 phase
• Serial # PTI-78124