Perkin Elmer 2400-SSA Sputtering System
2-8″ wafer capability
Physical Vapor Deposition System
(3)- 8″ DC Magnetron Cathodes
(1) RF Etch Station
CTI – 8 Cryo pump
2KW power supply – Power splitter – for co-deposition
Perkin Elmer 2400-SSA Sputtering System
2-8″ wafer capability
Physical Vapor Deposition System
(3)- 8″ DC Magnetron Cathodes
(1) RF Etch Station
CTI – 8 Cryo pump
2KW power supply – Power splitter – for co-deposition
