Plasmatherm Dual Chamber 790 PECVD & RIE

• Plasmatherm Dual Chamber 790 PECVD & RIE system
• Manual load, Non-Loadlock system
• RFPP – RF5S RF power supply with AM5 matching network & PS2 Tuner
• Leybold NT150/360 turbo controller with Leybold 361 turbo pump
• Ion Gauge with MKS 919 Ion Gauge Controller
• Watlow heaters and controler for PECVD chamber
• (6) gas lines with MFCs for each process chamber
• ond RF 350W power supply
• Plasmatherm Windows based operating system
• 208V, 60 Hz, 3 phase